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Title:
PRODUCTION METHOD OF PROTECTIVE FILM
Document Type and Number:
Japanese Patent JP2014026136
Kind Code:
A
Abstract:

To provide a production method of a protective film having excellent flatness on a substrate having a step.

The production method of a protective film includes steps of: applying a photosensitive resin composition containing a polymer (A), a (meth)acrylic compound (B), a polymerization initiator (C) and a solvent (E) on a rugged substrate to form a coating film; and exposing the coating film formed on a recessed part and a projected part of the rugged substrate through a multi-gradation mask in which the transmittance in a position corresponding to the recessed part is higher than the transmittance in a position corresponding to the projected part. The coating film is exposed through a multi-gradation mask in which the transmittance in a position corresponding to the recessed part is 60 to 100% and the transmittance in a position corresponding to the projected part is 10 to 50%.


Inventors:
SHIRAKAWA MASAKAZU
Application Number:
JP2012166677A
Publication Date:
February 06, 2014
Filing Date:
July 27, 2012
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/20; G03F1/00; G03F7/033; G03F7/09; G02B5/20
Domestic Patent References:
JP2009294498A2009-12-17
JP2010031091A2010-02-12
JP2010152336A2010-07-08
JP2010250120A2010-11-04
Foreign References:
WO2010010667A12010-01-28
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto



 
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