Title:
PRODUCTION METHOD OF VAPOR DEPOSITION MASK UNIT
Document Type and Number:
Japanese Patent JP2022157836
Kind Code:
A
Abstract:
To provide a production method of a vapor deposition mask unit capable of correcting a position easily.SOLUTION: A production method of a vapor deposition mask unit contains formation of a peeling layer on a support substrate, formation of a resist pattern on the peeling layer based on exposure data, and formation of a metal pattern on an area on the peeling layer where the resist pattern is not formed. The exposure data are corrected based on a parameter for correcting at least one of parallelogram strain, long side strain and short side strain.SELECTED DRAWING: Figure 4
Inventors:
YAMADA TETSUYUKI
Application Number:
JP2021062291A
Publication Date:
October 14, 2022
Filing Date:
March 31, 2021
Export Citation:
Assignee:
JAPAN DISPLAY INC
International Classes:
C23C14/04; H01L51/50; H05B33/10
Attorney, Agent or Firm:
Patent Attorney Corporation Takahashi Hayashi and Partners
Previous Patent: JPWO2022157835
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