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Patent Searching and Data


Title:
PRODUCTION OF MODIFIED POLYIMIDE
Document Type and Number:
Japanese Patent JPS6323928
Kind Code:
A
Abstract:

PURPOSE: To obtain a modified polyimide excellent in heat resistance and adhesion and useful for liquid crystal orientation films, surface protective films for semiconductor elements, α-ray shielding films, etc., by polycondensing a specified tetracarboxylic acid dianhydride with an aromatic diamine.

CONSTITUTION: A tetracarboxylic acid dianhydride (a) of at least 0.1mol% siloxane-containing tetracarboxylic acid dianhydride (a) of formula I (wherein R1W2 are each H or alkyl, R3W6 are each a 1W6C hydrocarbyl and n is 1W10) and at most 99.9mol% other aromatic tetracarboxylic acid dianhydrides (b) (e.g., pyromellitic dianhydride) is slowly added to a polar solvent solution of an aromatic dimaine (B) of formula II or III [wherein B is a (substituted) phenylene, a (substituted) biphenylele or a (substituted) naphthylene and Z is CH2, O, S or SO2] at 50°C or below to obtain a polar solvent solution of a polyamic acid as a procursor of a polyimide. This solution is suitably applied and heated to a temperature of 250W300°C to effect a ring closure reaction to obtain a coating or film of a siloxane-modified polyimide.


Inventors:
YAMADA YASUJI
FURUKAWA NOBUYUKI
Application Number:
JP16564086A
Publication Date:
February 01, 1988
Filing Date:
July 16, 1986
Export Citation:
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Assignee:
NIPPON STEEL CHEMICAL CO
International Classes:
C08G73/10; (IPC1-7): C08G73/10
Attorney, Agent or Firm:
Eiichi Sano