Title:
PRODUCTION OF MODIFIED RESIN
Document Type and Number:
Japanese Patent JPH0873540
Kind Code:
A
Abstract:
PURPOSE: To obtain a modified resin which can give a molding well balanced between impact resistance and rigidity.
CONSTITUTION: 100 pts.wt. metal salt of a copolymer of 70-99wt.% ethylene with 30-1wt.% α,β-unsaturated carboxylic acid, 0.1-50 pts.wt. heterocyclic- aromatic vinyl monomer containing a basic nitrogen atom as part of the aromatic ring, such as desirably 4-vinylpyridine or 2-vinylpyridine and 30-500 pts.wt. styrene monomer are subjected to aqueous suspension polymerization in the presence of a radical polymerization initiator.
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Inventors:
SHIBUYA SANEHIRO
YAMADA FUMIYOSHI
GOTO YUKITAKA
YAMADA FUMIYOSHI
GOTO YUKITAKA
Application Number:
JP21734494A
Publication Date:
March 19, 1996
Filing Date:
September 12, 1994
Export Citation:
Assignee:
MITSUBISHI CHEM CORP
International Classes:
C08F2/18; C08F255/00; C08F255/02; (IPC1-7): C08F255/02; C08F2/18
Attorney, Agent or Firm:
山本 隆也
Next Patent: ALKOXYSILYLATED ACRYL EMULSION