PURPOSE: To prevent the defective adhesiveness between a thin film and substrate in the circumferential direction of the substrate and the generation of crack in said direction and to improve the reliability of recording information by forming the thin film in the state in which the internal stress of the substrate is uniformized in the circumferential direction of the substrate.
CONSTITUTION: The substrate 1 is held in place between a supporting base 4 and an outer peripheral supporting mask 5 and in this state bolts 7 are successively screwed into all internal screw parts 13 of a mask retainer 8 to integrally couple the mask 5 and the base 4 so that the substrate 1 is completely grasped. Light is projected to the substrate 1 from below and the screwing down of the bolts 7 are adjusted until the concentrical interference fringe patterns are generated by the light reflected from the substrate supporting surface 3 of the base 4 and the substrate 1. The internal stress of the substrate 1 in this state is uniformized in the circumferential direction of the substrate. The thin film having the internal stress uniform in the circumferential direction of the substrate is formable if sputtering is executed in this state.
NOMURA MASAAKI
YAMAMOTO RYOICHI
NAHARA AKIRA
