Title:
PRODUCTION OF ORGANOSILICON RESIN
Document Type and Number:
Japanese Patent JPH03139526
Kind Code:
A
Abstract:
PURPOSE:To obtain an organosilicon resin of uniform quality in good yields at low cost by hydrolyzing a specified organosilane, neutralizing the hydrolyzate, performing solvent substitution and subjecting the product to alkaline polymerization, acid treatment, neutralization, dehydration and filtration. CONSTITUTION:An organosilicon resin having an (m) to (n) molar ratio in formula II of 0.5-1.8 and comprising monofunctional siloxane units and tetrafunctional siloxane units is obtained by feeding an organosilane of formula I and an organosilane of formula II or its partial hydrolytic condensate to a reactor and hydrolyzing them by adding an acid and water dropwise thereto, adding an acid which can keep the pH of the system at 3-6 to the system after neutralizing the acid by adding an alkali metal hydrogencarbonate, adding a solvent to the system after removing the alcohol by-product and excess water from the system, adding at least one of an alkali metal hydroxide and an alkali metal carbonate and/or hydrogencarbonate to the system, polymerizing the hydrolyzate by heating, removing the alkaline polymerization catalyst by neutralization with an acid, and removing excess acid, free water, salts and the dehydrating agent.
Inventors:
GOMYO SHIRO
KOBORI TAKAHIDE
MORI SHIGERU
KOBORI TAKAHIDE
MORI SHIGERU
Application Number:
JP27671089A
Publication Date:
June 13, 1991
Filing Date:
October 24, 1989
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
C08G77/02; (IPC1-7): C08G77/02
Attorney, Agent or Firm:
Ryoichi Yamamoto (1 person outside)
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