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Patent Searching and Data


Title:
PRODUCTION OF PHOSPHOR PATTERN
Document Type and Number:
Japanese Patent JPH09265183
Kind Code:
A
Abstract:

To provide a process for producing phosphor patterns which improves the embedding property (moldability barrier rib wall surfaces of a substrate for PDP(plasma display panel) and photosensitive resin compsn. layer contg. the phosphors on a substrate surface) into the spaces of the substrate having ruggedness, such as substrate for the PDP, prevent color mixing and are capable of forming the phosphor patterns having a uniform shape with high accuracy only into the inside surfaces of recessed parts with allowance.

The photosensitive resin compsn. layer contg. the phosphors is formed on the substrate 1 having the ruggedness and a photosensitive thermoplastic resin layer is arranged on this compsn. layer and is thermally pressure bonded in this state thereto. The photosensitive element is irradiated imagewise with the active rays in the state that air contg. oxygen exists on the photosensitive resin layer and the unnecessary parts are removed by development. Further, the unnecessary parts are removed by baking.


Inventors:
NOJIRI TAKESHI
TACHIKI HIDEYASU
TANAKA HIROYUKI
WADA YUMIKO
TAI SEIJI
Application Number:
JP7552996A
Publication Date:
October 07, 1997
Filing Date:
March 29, 1996
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
G03F7/004; C08F20/10; C08F20/20; C09K11/08; G03F7/027; G03F7/40; H01J9/227; (IPC1-7): G03F7/004; C09K11/08; G03F7/004; G03F7/027; G03F7/40; H01J9/227
Attorney, Agent or Firm:
Kunihiko Wakabayashi