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Title:
PRODUCTION OF PHOSPHOR PATTERN
Document Type and Number:
Japanese Patent JPH10186644
Kind Code:
A
Abstract:

To make it possible to form phosphor patterns of uniform shapes with high accuracy by forming positive type photosensitive resin layers on the substrate base and rib wall surfaces within the discharge spaces of a substrate for a plasma display panel formed with barrier ribs.

The positive photosensitive resin layers C5 are formed on the substrate base and rib wall surfaces within the discharge spaces of the substrate for the plasma display panel formed with the barrier ribs. The positive photosensitive resin layers C5 are irradiated imagewise with active rays and the irradiated parts thereof are removed by development. A negative photosensitive resin compsn. layer A7 contg. the phosphors and a thermoplastic resin layer B7 are thermally press bonded onto the substrate for the plasma display panel from which the positive type-photosensitive resin compsns. C5 are removed only in the desired parts by disposing the A layer 7 on the substrate side. These layers are irradiated imagewise with the active layers. The unnecessary parts of the theremally press bonded A layer 7 and B layer 6 are removed by development. The multicolor patterns consisting of the photosensitive resin compsns. contg. the phosphors developing red, green and blue are formed by repeating these stages. The unnecessary parts are removed by baking.


Inventors:
TACHIKI HIDEYASU
NOJIRI TAKESHI
TANAKA HIROYUKI
WADA YUMIKO
TAI SEIJI
Application Number:
JP34925196A
Publication Date:
July 14, 1998
Filing Date:
December 27, 1996
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
G03F7/004; B32B7/02; C09D4/06; C09K11/08; G03F7/26; G03F7/40; H01J9/227; (IPC1-7): G03F7/004; B32B7/02; C09K11/08; G03F7/26; G03F7/40; H01J9/227
Attorney, Agent or Firm:
Hotaka Tetsuo