PURPOSE: To obtain a photosensitive lithographic plate improved in water retentivity, hard to contaminate, and enhanced in adhesion between a photosensitive layer and a substrate by a method wherein a surface of an aluminum alloy plate or the like is electrolytically roughened and anodized, and thereon the photosensitive layer is applied by a specific coating weight.

CONSTITUTION: In the production of a photosensitive lithographic plate, a surface of an aluminum plate or an aluminum allay plate is electrolytically roughened and anodized, and thereon a photosensitive layer is applied. At this time, the electrolytically roughening treatment is carried out using an alternating current in an electrolyte containing chlorine ion under conditions that an on-anode current density is 20-30A/dm2 and an on-anode quantity of electricity is 300 coulomb/dm2 or more. The coating weight of the photosensitive layer is set within the range of 0.5-2.0g/m2. In this manner, the obtained photosensitive lithographic plate is so improved in water retentivity that a shadow part cannot collapse even with a small amount of dampening water, hard to contaminate, and enhanced in adhesion between the photosensitive layer and the substrate.