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Title:
PRODUCTION OF PHOTOSENSITIVE MATERIAL FOR LITHOGRAPHIC PRINTING PLATE
Document Type and Number:
Japanese Patent JP61005251
Kind Code:
A
Abstract:

PURPOSE: To obtain a photosensitive material at a low cost by coating superposedly and simultaneously at least one photosensitive coating liquid and at least one coating liquid contg. an electron ray-curing compd. on a base having a hydrophilic surface.

CONSTITUTION: At least two kinds of non-aqueous coating liquids of which at least one is the photosensitive coating liquid and the coating liquid contg. the electron ray-curing compd. is coated on the base having the hydrophilic surface and thereafter electron rays are irradiated thereto to form a photosensitive layer, by which the photosensitive material for lithographic printing plate is obtd. At least one coating liquid of the above-described non-aqueous coating liquids is required to have ≥50cps, more preferably ≥80cps viscosity. The electron rays are so irradiated as to attain 150W300kV acceleration voltage and 0.08W7Mrad absorption dose. A metallic sheet, plastic film, etc. are used for the blank material of the base.


Inventors:
Inukai, Yuzo
Naruse, Yasuto
Nakayama, Takao
Application Number:
JP1984000124983
Publication Date:
January 11, 1986
Filing Date:
June 18, 1984
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/00; G03F7/095; G03F7/16; (IPC1-7): G03F7/02



 
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