Title:
PRODUCTION OF POLYBENZOXAZOL PRECURSOR AND RESIST SOLUTION
Document Type and Number:
Japanese Patent JP3093630
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To inexpensively obtain environmentally friendly, alkali-soluble polybenzoxazol precursors by reacting a halogenated dicarboxylic acid with a bis(o-aminophenol) in an organic solvent with the use of a polymer with a tertiary N atom, which is insoluble therein and then, separating excess polymer and a hydrogen halide.
SOLUTION: In (A) an organic solvent such as N-methylpyrrolidone in the presence of (B) a polymer containing a tertiary nitrogen atom which is insoluble in component (A) such as reticulated poly(4-vinylpyridine), (C) a halogenated dicarboxylic acid such as a dicarboxylic acid chloride is reacted with (D) a bis-(o-aminophenol) such as 2,2,-bis-(3-amino-4-hydroxyphenyl)-propane to separate excess component (B) and a hydrogen halide from this reaction solution and, if necessary, further purifying the reaction solution after separation by an ion exchange device to obtain a desired precursor. For example, the reaction solution containing this precursor is mixed with a photoactive component such as quinone diazide to be able to obtain a resist solution useful in the electronic field or the like.
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Inventors:
Lekai Zechi
Helmut Arne
FA Ritsucel
Helmut Arne
FA Ritsucel
Application Number:
JP9184496A
Publication Date:
October 03, 2000
Filing Date:
March 22, 1996
Export Citation:
Assignee:
Siemens Aktiengesellschaft
International Classes:
G03F7/022; C08G69/28; C08G69/32; C08G73/22; G03F7/023; G03F7/037; G03F7/039; (IPC1-7): C08G73/22; G03F7/022; G03F7/037; G03F7/039
Other References:
Ｐｏｌｙｍ．Ｐｒｅｐｒ．（Ａｍ．Ｃｈｅｍ．Ｓｏｃ．，Ｄｉｖ．Ｐｏｌｙｍ．Ｃｈｅｍ．）（１９９０），３１（２），ｐｐ．６７５−６７６
Attorney, Agent or Firm:
Iwao Yamaguchi