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Title:
PRODUCTION OF PREPREG
Document Type and Number:
Japanese Patent JPH08259711
Kind Code:
A
Abstract:

PURPOSE: To facilitate the production of a prepreg which has excellent dielectric properties and is excellent in chemical resistance and heat resistance after cure by dissolving a polyphenylene ether resin in tetrahydrofuran in a specific concentration and infiltrating the solution into a substrate.

CONSTITUTION: A resin composition comprising a polyphenylene ether resin such as poly(2,6-dimethyl-1,4-phenylene ether), a styrene graft polymer thereof, or a 2,6-dimethylphenol/2,3,6-trimethylphenol copolymer is dissolved in tetrahydrofuran in an amount of up to 20g per 100ml of the solvent. The solution is infiltrated into a substrate at room temp. to obtain the prepreg, which has a satisfactory surface state and is suitable for use as a dielectric, insulating, or heat-resistant material in the aerospace industry, electronic industry, etc.


Inventors:
ISHII YOSHIYUKI
KATAYOSE TERUO
Application Number:
JP6619795A
Publication Date:
October 08, 1996
Filing Date:
March 24, 1995
Export Citation:
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Assignee:
ASAHI CHEMICAL IND
International Classes:
B29B11/16; B29B15/10; C08J5/24; C08K5/14; C08K5/3492; C08L71/00; C08L71/08; C08L71/12; B29K71/00; B29K105/08; (IPC1-7): C08J5/24; B29B11/16; B29B15/10; C08K5/14; C08K5/3492; C08L71/12



 
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