PURPOSE: To assure pattern inspection at a high speed with high accuracy and to improve efficiency by using an electrodeposition liquid prepd. by dispersing a fluorescent light emitting material into an electrodeposition photosensitive resist polymer.

CONSTITUTION: The fluorescent light emitting material Kayaset Flavin FG which excites fluorescent light emission at 420nm laser wavelength without degrading the UV light transmittability of the electrodeposition photosensitive resist to hinder pattern formability is dissolved in a hydrophilic org. solvent, such as dioformic acid and is dispersed into the polymer of the electrodeposition photosensitive resist. This resist is neutralized with amine and is intimately mixed with deionized water by a high-speed device, by which the liquid is emulsified. An electrodeposited film is formed on a substrate by such aq. electrodeposition photosensitive resist soln. and the substrate which is held formed with the patterns is inspected by a fluorescent reflection type, by which the inspection accuracy and inspection efficiency are improved.