Title:
PRODUCTION OF QUARTZ GLASS FOR VACUUM ULTRAVIOLET AND QUARTZ GLASS OPTICAL MEMBER
Document Type and Number:
Japanese Patent JP3125630
Kind Code:
B2
Abstract:
PURPOSE: To obtain a synthetic quartz glass capable of allowing hydrogen in molecular state to exist together with fluorine in the synthetic quartz glass, being used for a high precision optical system such as an optical lithography in vacuum ultraviolet region and having both high transmissivity to vacuum ultraviolet region and high ultraviolet ray resistance by doping hydrogen after doping fluorine into a soot body and making it transparent.
CONSTITUTION: (a) A porous glass (that is, a soot body) is formed by hydrolyzing a silicon compound such as SiCl4 in oxyhydrogen flame to obtain glass fine particles (that is, a soot) and heaping the glass fine particles. Next, (b) a fluorine doped porous glass is obtained by heating the porous glass in a fluorine containing atmosphere. Then, (c) a fluorine doped synthetic quartz glass is obtained by making the fluorine porous glass transparent. Further, (d) the fluorine and hydrogen doped synthetic quartz glass is obtained by heating the fluorine doped synthetic quartz glass in a gaseous hydrogen containing atmosphere.
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Inventors:
Hiroyuki Hiraiwa
Masashi Fujiwara
Norio Komine
Masashi Fujiwara
Norio Komine
Application Number:
JP17098495A
Publication Date:
January 22, 2001
Filing Date:
July 06, 1995
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; C03B8/04; C03B19/14; C03B20/00; C03C3/06; C03C4/00; G02B1/00; H01S3/17; (IPC1-7): C03B20/00; C03B8/04; C03C3/06; C03C4/00; G02B1/00; G03F7/20
Domestic Patent References:
| JP4195101A | ||||
| JP6166522A | ||||
| JP6166528A | ||||
| JP6227827A |