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Title:
PRODUCTION OF SEMI-INSULATIVE GAAS SINGLE CRYSTAL
Document Type and Number:
Japanese Patent JPH10167898
Kind Code:
A
Abstract:

To obtain a semi-insulative GaAs single crystal which is constant in the carbon concn. in a crystal growth direction by a VGF method and VB method.

A crucible 3 contg. GaAs raw materials 5 and B2O3 6 and an oxygen supply source 8 consisting of one or ≥2 compds. selected from a group consisting of As for vapor pressure control and Ga2O3 and As2O3 8 or one or ≥2 compds. selected from a group consisting of carbon monoxide and carbon dioxide are sealed into a quartz ampoule. Crystal growth is executed while the concn. of the gaseous Co in the quartz ampoule is controlled. The execution of the crystal growth while controlling the concn. of the carbon in the crystal growth is made possible. The semi-insulative GaAs single crystal 10 having the uniform carbon concn. is thus obtd. at a high yield.


Inventors:
ASAHI TOSHIAKI
ODA OSAMU
Application Number:
JP33235696A
Publication Date:
June 23, 1998
Filing Date:
December 12, 1996
Export Citation:
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Assignee:
JAPAN ENERGY CORP
International Classes:
C30B11/00; C30B27/00; C30B29/42; H01L21/208; (IPC1-7): C30B29/42; C30B11/00; C30B27/00; H01L21/208
Attorney, Agent or Firm:
Hiroshi Arafune