Title:
PRODUCTION OF SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPS5299074
Kind Code:
A
Abstract:
PURPOSE:Ingress of resist agents is eliminated and etching time is reduced by removing the desired parts of the resist films formed on the entire surface of a semiconductor wafer by laser beam or dicing device thus forming groove holes and eliminating the need for masks and mask alignment.
More Like This:
| JPH01198075 | MANUFACTURE OF THYRISTOR |
Inventors:
KACHI MASAO
ASAMI HIROSHI
ASAMI HIROSHI
Application Number:
JP1635076A
Publication Date:
August 19, 1977
Filing Date:
February 16, 1976
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
H01L29/74; H01L21/027; H01L21/302; H01L21/306; H01L21/331; H01L29/73; (IPC1-7): H01L21/302
Domestic Patent References:
| JP32001485A | ||||
| JPS5218175A | 1977-02-10 |