Title:
PRODUCTION OF SILICON-CONTAINING ACETAMIDE DERIVATIVE
Document Type and Number:
Japanese Patent JP2621007
Kind Code:
B2
Abstract:
PURPOSE: To produce a high-purity silicon-containing acetamide derivative in high yield.
CONSTITUTION: Acetamide or N-trimethylsilylacetamide is reacted with N- trimethylsilylimidazole to give a silicon-containing acetamidc derivative, which is taken out from a reaction system by distillation operation according to the degree of the formation to produce a silicon-containing acetamide derivative. The reaction is carried out in the presence of an organic sulfonic acid to give the silicon-containing acetamide derivative.
Inventors:
Norio Shinohara
Kudo Muneo
Kudo Muneo
Application Number:
JP30037592A
Publication Date:
June 18, 1997
Filing Date:
October 12, 1992
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07F7/10; B01J31/02; B01J31/06; B01J31/12; C07B61/00; C07F7/18; (IPC1-7): C07F7/18
Domestic Patent References:
| JP562993A | ||||
| JP6379889A | ||||
| JP63192790A |
Attorney, Agent or Firm:
Kiyoaki Takita
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