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Patent Searching and Data


Title:
PRODUCTION OF SPUTTERING SINTERED TARGET MATERIAL FOR FORMATION OF OXIDE THIN FILM HAVING (BA, SR)TI PEROVSKITE STRUCTURE
Document Type and Number:
Japanese Patent JPH08277467
Kind Code:
A
Abstract:

PURPOSE: To obtain an excellent target for the formation of an oxide thin film having a (Ba,Sr)Ti perovskite structure by oxidizing and reducing a Ba-Sr- Ti oxide powder and sintering the powder in a vacuum hot press.

CONSTITUTION: A Ba-Ti oxide powder and a Sr-Ti oxide powder or (Ba,Sr)Ti oxide powder, each prepared by a sol-gel processing and having 1-10μm average particle size, are used as the source material and oxidized in an oxidative atmosphere such as air at 700-1200°C to decrease the carbon content to ≤1000ppm and the oxygen content to the amt. corresponding to the stoichiometric value. Then the source material is reduced by heating at 450-1300°C in a hydrogen atmosphere to decrease the carbon content to ≤100ppm and the oxygen content to less than the stoichiometric value. Then the source material is hot-pressed in vacuum to obtain a sintered body having ≤30ppm carbon content. Thus, a sputtering target for the formation of a thin oxide thin film having a (Ba, Sr)Ti perovskite structure is produced as the sintered body above described. The obtd. target has excellent toughness and little carbon content.


Inventors:
HIJIKATA KENICHI
WATANABE KAZUO
SHIONO ICHIRO
Application Number:
JP10686895A
Publication Date:
October 22, 1996
Filing Date:
April 06, 1995
Export Citation:
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Assignee:
MITSUBISHI MATERIALS CORP
International Classes:
C04B35/622; C01G1/00; C04B35/46; C23C14/34; F27B17/00; H01L21/31; (IPC1-7): C23C14/34; C04B35/46; C04B35/622; F27B17/00; H01L21/31
Attorney, Agent or Firm:
富田 和夫 (外1名)