PRODUCTION OF STOCK FOR VAPOR DEPOSITION OR STOCK OF TARGET FOR SPUTTERING

Title:

PRODUCTION OF STOCK FOR VAPOR DEPOSITION OR STOCK OF TARGET FOR SPUTTERING

Document Type and Number:

Japanese Patent JPH0551730

Kind Code:

A

Abstract:

PURPOSE: To enhance the yield of material and to reduce cost by erecting casting molds in vacuum, feeding a molten metal into the molds from the bottoms through a runner and obtaining a shape and dimensions close to those of an end product.

CONSTITUTION: A molten high purity metal or alloy 2 obtd. by melting and refining in a vacuum melting furnace is housed in a vessel 1, fed into cylindrical casting molds 4 in vacuum and cast to produce stock for vapor deposition or stock of a target for sputtering. At this time, the molds 4 are erected in vacuum, the molten metal or alloy 2 is fed into the molds 4 from the bottoms through a runner 3 and a shape and dimensions close to those of an end product are obtd. The molds 4 are tapered in the longitudinal direction and caps 5 are fixed on the tops of the molds 4. Stock almost free from internal defects can be obtd.

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Inventors:

TABEI KAZUHIKO
YONEZAWA NOBORU
SAITO SADAO

Application Number:

JP5516091A

Publication Date:

March 02, 1993

Filing Date:

March 19, 1991

Export Citation:

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Assignee:

MITSUBISHI MATERIALS CORP

International Classes:

B22D7/06; C22B9/04; C23C14/24; C23C14/34; (IPC1-7): B22D7/06; C22B9/04; C23C14/24; C23C14/34

Domestic Patent References:

JPH0262110A	1990-03-02
JP61063344B
JP49120813B

Attorney, Agent or Firm:

Masatake Shiga (2 outside)

Next Patent: ABSENCE TRANSFER SYSTEM