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Patent Searching and Data


Title:
PRODUCTION OF SUBSTITUTED POLYSILYLENEMETHYLENES
Document Type and Number:
Japanese Patent JPH10182833
Kind Code:
A
Abstract:

To provide a process for producing substituted polysilylenemethylenes excellent in thermal resistance and moldability without using any metal catalyst at a relatively low temp.

A 1,3-disilacyclobutane of the formula: (RR'SiCH2)2 (wherein R and R' may be the same or different and represent each hydrogen, a 1-8C alkyl, a halogenated alkyl, an alkenyl or an aryl, provided they both cannot be hydrogen at the same time) is heated in the presence of a lipophilic org. peroxide and a lipophilic organic azo compd. as a radical-forming agent to open the ring and thereby to form a substd. polysilylenemethylene having repeating units of the formula: -(RR'SiCH2)2-.


Inventors:
OGAWA TAKUYA
MURAKAMI MASASHI
Application Number:
JP34845496A
Publication Date:
July 07, 1998
Filing Date:
December 26, 1996
Export Citation:
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Assignee:
DOW CORNING ASIA LTD
International Classes:
C08G77/60; (IPC1-7): C08G77/60
Attorney, Agent or Firm:
Takashi Ishida (3 others)