Title:
PRODUCTION OF SUPERCONDUCTING THIN FILM
Document Type and Number:
Japanese Patent JPH02255502
Kind Code:
A
Abstract:
PURPOSE: To obtain a superconducting thin film having a stoichiometric compsn. over all by carrying out presputtering for a prescribed time and then carrying out regular sputtering when an oxide superconducting thin film is produced by sputtering.
CONSTITUTION: When a thin film of an oxide superconductor is formed by sputtering, a target having a compsn. prepd. in expectation of a change in the compsn. of the surface of the target during pre-sputtering is used so that a desired compsn. of a film is obtd. by regular sputtering. Presputtering is carried out until the compsn. of the surface of the target is made unchangeable and then regular sputtering is carried out to form a thin film.
Inventors:
ITOZAKI HIDEO
MATSUURA TAKASHI
HIGAKI KENJIRO
TANAKA SABURO
YATSU SHUJI
MATSUURA TAKASHI
HIGAKI KENJIRO
TANAKA SABURO
YATSU SHUJI
Application Number:
JP7621589A
Publication Date:
October 16, 1990
Filing Date:
March 28, 1989
Export Citation:
Assignee:
SUMITOMO ELECTRIC INDUSTRIES
International Classes:
C01B13/14; C01G1/00; C01G3/00; C01G29/00; C23C14/08; C23C14/34; H01B12/06; H01B13/00; H01L39/24; (IPC1-7): C01B13/14; C01G3/00; C01G29/00; C23C14/08; C23C14/34; H01B12/06; H01B13/00; H01L39/24
Attorney, Agent or Firm:
Takashi Koshiba
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