To form extremely thin rutile even on the surface of thick anatase in various forms by a method in which after ions of Ar and others are emitted to the surface of anatase-type titanium oxide with the use of ion beams, rutile- type titanium oxide is formed on the surface of anatase-type titanium oxide by annealing.
An anatase-type titanium oxide thin film 1 to be a substrate is formed on a silicon wafer by RF(radio frequency) sputtering. Next, the surface of the film 1 is irradiated with ions of Ar. He, Ne or the like by using ion beams to form an ion-irradiated layer 2, a modified layer. After the irradiation, the layer 2 is annealed at 500-700°C to form rutile-type titanium oxide 3, when an anatase-type titanium oxide layer is irradiated with Ar ion beams, Ti3+ and Ti2+ are formed in an irradiated part in the film by the impact of Ar ions to form rutile preferentially on the surface of the film.
| JP2002293667 | CERAMIC COMPACT |
| WO/2005/011862 | CATALYST FOR GAS PHASE OXIDATIONS |
| WO/2022/207896 | USE OF A CATALYST SYSTEM IN THE PRODUCTION OF 1,3-BUTADIENE FROM ETHANOL IN TWO STAGES |
HONDA YUKIO
MIYAGAWA RYUJI
KUBOTA HIROSHI
SUMITA YASUSHI
UNIV KUMAMOTO