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Patent Searching and Data


Title:
PRODUCTION OF THIO(METH)ACRYLATE COMPOUND
Document Type and Number:
Japanese Patent JPH0925264
Kind Code:
A
Abstract:

To obtain a high-quality thio(meth)acrylate compound, which is useful as a raw material for a highly functional resin raw material such as a raw material for an optical element, etc., but is unstable to a base, in high yield and simply by carrying out a reaction in the absence of a base.

A thiol compound of formula I (R is an aliphatic residue, etc.; (n) is an integer of 1-4) is directly reacted with a propionic acid derivative of formula II (R1 is H or methyl; X and Y are each Cl or Br) in the absence of a base to give a β-halopropionic acid thioester compound of formula III. The compound of formula III is dehydrohalogenated to give the objective compound of formula IV. The reaction is advanced under circulation of an inert gas while removing a formed hydrogen halide gas out of the system.


Inventors:
SUZUKI YORIYUKI
SASAGAWA KATSUYOSHI
KAWAUCHI KEIYA
IMAI MASAO
KOBAYASHI SEIICHI
FUJII KENICHI
Application Number:
JP17731395A
Publication Date:
January 28, 1997
Filing Date:
July 13, 1995
Export Citation:
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Assignee:
MITSUI TOATSU CHEMICALS
International Classes:
C07C327/22; (IPC1-7): C07C327/22