Title:
PRODUCTION OF TITANIUM MAGNETIC DISK SUBSTRATE
Document Type and Number:
Japanese Patent JP2500031
Kind Code:
B2
Abstract:
PURPOSE: To provide the process for production of the titanium magnetic disk substrate which can form this magnetic disk substrate to ≤0.025μm surface roughness Rmax.
CONSTITUTION: The surface roughness Rmax of a titanium plate prior to an anodic oxidation treatment is set at ≤0.04μm at the time of producing the titanium magnetic disk substrate by subjecting a bland material for the titanium magnetic disk substrate to the anodic oxidation treatment. The voltage at the time of the anodic oxidation treatment is set at 4 to 12V and further, the current density at the end of of the anodic oxidation treatment is set at ≤5×10-4A/mm2.
Inventors:
OKANO YOKO
SUENAGA HIROYOSHI
SAKYAMA TOSHIO
MORITA KENJI
OOMURA MASAKI
SUENAGA HIROYOSHI
SAKYAMA TOSHIO
MORITA KENJI
OOMURA MASAKI
Application Number:
JP16170991A
Publication Date:
May 29, 1996
Filing Date:
July 02, 1991
Export Citation:
Assignee:
NIPPON KOKAN KK
International Classes:
C25D11/26; G11B5/84; (IPC1-7): G11B5/84; C25D11/26
Domestic Patent References:
| JP5671821A |
Attorney, Agent or Firm:
Takehiko Suzue