Title:
PRODUCTION OF TRIPHENOL-BASED COMPOUND
Document Type and Number:
Japanese Patent JP3787870
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain the subject high-purity compound useful as a component for a resist composition for fine processing of a semiconductor in high selectivity in high yield by reacting dihydroxymethyl-methylphenol with xylenol and specifically treating the reaction product after the reaction.
SOLUTION: (A) 2,6-Dihydroxymethyl-4-methylphenol is reacted with (B) 2,5-xylenol in an alcohol-containing solvent in the presence of an acid catalyst. After the reaction product is neutralized, a water layer is removed, an organic layer is heat-treated at ≥50°C temperature not to actually change the volume of a material to be treated and a product is taken out. The molar ratio of the component B to the component A is preferably 2-10. The amount of the acid catalyst is 0.01 to 1mol based on the component A. The reaction is preferably carried out by adding the component A to the mixture of the component B, the acid catalyst and the solvent for 0.01-12 hours.
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Inventors:
Koji Ichikawa
Hiroshi Sakamoto
Tomioka Atsushi
Haruki Ozaki
Hiroshi Sakamoto
Tomioka Atsushi
Haruki Ozaki
Application Number:
JP29713195A
Publication Date:
June 21, 2006
Filing Date:
November 15, 1995
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C37/16; C07C39/15; C07B61/00; C07C37/72; C07C37/84; (IPC1-7): C07C39/15; C07C37/16; C07C37/72; C07C37/84; //C07B61/00
Domestic Patent References:
| JP5323597A | ||||
| JP59157040A | ||||
| JP6199719A |
Attorney, Agent or Firm:
Takashi Kuboyama