Title:
材料ガス濃度制御システム及び材料ガス濃度制御システム用プログラム
Document Type and Number:
Japanese Patent JP5419276
Kind Code:
B2
Abstract:
To prevent loss of control of a pressure of a source gas within a movable range of a control valve, a source gas concentration control system is provided. The system may include a first valve that is provided on an outlet line, a concentration measurement part that measures a concentration of the source gas in mixed gas, and a concentration control part that controls a stroke of the first valve such that the measured concentration of the source gas becomes equal to a predetermined concentration setting. The measured concentration may be measured in the concentration measurement part. The system may further include a temperature controller that controls a temperature inside the tank to meet a temperature setting, and a temperature setting part that sets the temperature setting of the temperature controller.
Inventors:
Masakazu Minami
Inoue Regular
Inoue Regular
Application Number:
JP2009293533A
Publication Date:
February 19, 2014
Filing Date:
December 24, 2009
Export Citation:
Assignee:
HORIBA, Ltd.
HORIBA STEC Co., Ltd.
HORIBA STEC Co., Ltd.
International Classes:
H01L21/205; C23C16/448; C23C16/52; H01L21/304; H01L21/31
Domestic Patent References:
| JP9063965A | ||||
| JP2001068465A | ||||
| JP62285415A |
Attorney, Agent or Firm:
Ryuhei Nishimura
Akiko Sato
Saito Shindai
Akiko Sato
Saito Shindai
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