Title:
PROJECTION ALIGNER AND PROJECTION EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2005191278
Kind Code:
A
Abstract:
To provide a projection aligner and a projection exposure method for reliably and easily correcting aberration generated, when using a hard pellicle.
The projection aligner comprises a light source, an optical system, a reticle stage for retaining reticle, a first position adjustment mechanism for adjusting the position of the reticle, a wafer stage for placing a wafer, a plate for correcting aberration provided between the reticle and the wafer, and an angle adjustment mechanism for adjusting the tilt angle of the plate for correcting aberration.
Inventors:
SUGANAGA TOSHIFUMI
Application Number:
JP2003430807A
Publication Date:
July 14, 2005
Filing Date:
December 25, 2003
Export Citation:
Assignee:
SEMICONDUCTOR LEADING EDGE TEC
International Classes:
G03F7/20; G03F9/00; H01L21/027; (IPC1-7): H01L21/027; G03F7/20; G03F9/00
Domestic Patent References:
| JP2002182372A | 2002-06-26 | |||
| JPH1027743A | 1998-01-27 | |||
| JPH1054932A | 1998-02-24 | |||
| JP2002050558A | 2002-02-15 |
Attorney, Agent or Firm:
Masahiko Hinataji
Mitsuyuki Matsuyama
Mitsuyuki Matsuyama