Title:
PROJECTION ALIGNER AND FABRICATION OF SEMICONDUCTOR ELEMENT USING THE SAME
Document Type and Number:
Japanese Patent JPH05144701
Kind Code:
A
Abstract:
PURPOSE: To obtain a projection aligner and fabrication method of semiconductor element in which fluctuation of optical characteristics due to thermal fluctuation caused by absorption of exposing light is corrected and a pattern image can be projected with high resolution.
CONSTITUTION: When a pattern on the surface of first object 2 is projected through a projection optical system 1 onto the surface of second object 3, a profile measuring means 11 measures information relevant to fluctuation of profile due to thermal fluctuation of at least one lens constituting the projection optical system and a regulating means regulates the optical characteristics of the projection optical system based on signals fed from the profile measuring means.
Inventors:
UNNO YASUYUKI
ORII SEIJI
YONEKAWA MASAMI
ORII SEIJI
YONEKAWA MASAMI
Application Number:
JP33443891A
Publication Date:
June 11, 1993
Filing Date:
November 22, 1991
Export Citation:
Assignee:
CANON KK
International Classes:
G03F7/20; G03F7/207; H01L21/027; H01L21/30; (IPC1-7): G03F7/20; G03F7/207; H01L21/027
Attorney, Agent or Firm:
Takanashi Yukio
Previous Patent: JPS5144700
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