Title:
PROJECTION ALIGNER, MASK PATTERN FOR EVALUATING ABERRATION, METHOD FOR EVALUATING ABERRATION, FILTER FOR REMOVING ABERRATION AND PRODUCTION OF SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPH09167731
Kind Code:
A
Abstract:
To perform highly accurate pattern transfer by eliminating the effect of aberration attended with the optical system.
Ultraviolet rays emitted from a lamp house 1 is split a fly eye lens 3 into a large number of independent spot light sources and shaped through an aperture 4 to form a secondary light source plane. An exposing region is then set by means of a blind 6 and a photomask 10 is illuminated to form the light source image of diffracted light from the photomask 10 on the pupil plane of a projection optical system 11. Wave aberration is then compensated by means of an aberration removing filter 13 arranged on the pupil plane of projection optical system 11 and a circuit pattern is focused on a water 12.
Inventors:
KAMON KAZUYA
Application Number:
JP32598895A
Publication Date:
June 24, 1997
Filing Date:
December 14, 1995
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
G02B5/18; G02B13/24; G02B19/00; G02B27/00; G03F1/44; G03F1/70; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G02B5/18; G02B13/24; G02B19/00; G03F1/08; G03F7/20
Attorney, Agent or Firm:
Soga Doteru (6 people outside)
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