PURPOSE: To perform transferring through highly accurate pattern having no local thermal expansion by pattern-transferring while heating continuously and intermittently areas other than an area to be applied with a beam, when the beam is directed on the mask.
CONSTITUTION: When a mask 81 is subject to illumination, the areas 53 other than an area 51 illuminated by a beam in the mask 81 is heated continuously and intermittently. As the result, a part 52 adjacent to its surface will be expanded in the areas applied with the beam. On the other hand, since the areas 53 other than the area 51 applied with the beam are also heated continuously and intermittently, parts 54 adjacent to their surface will be expanded. Therefore, the overall surface of the mask 81 will be expanded, thereby eliminating local thermal expansion and image-forming and transferring an optional pattern. Thus, local and surfacial expansion on the mask can be prevented and highly reliable pattern transferring can be performed as well.
TERASAWA TSUNEO
ITO MASAAKI
TAKEDA EIJI
