Title:
PROJECTION EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2019091065
Kind Code:
A
Abstract:
SOLUTION: A rectile is actually put into a device when using a first rectile to perform oblique measurement and random measurement. A measurement spot size that is generally fixed is made variable and an incident angle is changed according to the measurement spot size.EFFECT: A partial sampling risk can be avoided even without increasing the number of samplings to catch a rectile transmittance of the entire rectile used as a population.SELECTED DRAWING: Figure 3
Inventors:
MURATA MICHIHIRO
GOMI YUTAKA
GOMI YUTAKA
Application Number:
JP2019013614A
Publication Date:
June 13, 2019
Filing Date:
January 29, 2019
Export Citation:
Assignee:
ABLIC INC
International Classes:
G03F9/00; G03F9/02
Domestic Patent References:
| JP2009004632A | 2009-01-08 | |||
| JP2008098383A | 2008-04-24 | |||
| JP2006039059A | 2006-02-09 | |||
| JP2004259744A | 2004-09-16 | |||
| JP2002049653A | 2002-02-15 | |||
| JP2001222097A | 2001-08-17 | |||
| JPH0850359A | 1996-02-20 | |||
| JPH06236838A | 1994-08-23 |
Foreign References:
| US20070117409A1 | 2007-05-24 |