Title:
マイクロリソグラフィのための投影露光方法および投影露光装置
Document Type and Number:
Japanese Patent JP7063908
Kind Code:
B2
Abstract:
The disclosure provides a projection exposure method for exposing a substrate arranged in the region of an image plane of a projection lens with at least one image of a pattern of a mask arranged in the region of an object plane of the projection lens. A substrate is coated with a radiation-sensitive multilayer system including a first photoresist layer composed of a first photoresist material and, between the first photoresist layer and the substrate and a separately applied second photoresist layer composed of a second photoresist material. The first photoresist material has a relatively high first sensitivity in a first wavelength range and a second sensitivity, which is lower relative to the first sensitivity, in a second wavelength range separate from the first wavelength range. The second photoresist material has an exposure-suitable second sensitivity in the second wavelength range.
Inventors:
Patra Michael
Application Number:
JP2019536648A
Publication Date:
May 09, 2022
Filing Date:
August 24, 2017
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; H01L21/027
Domestic Patent References:
| JP1077123A | ||||
| JP2007173826A | ||||
| JP5102004A | ||||
| JP60147731A |
Foreign References:
| US5303002 | ||||
| US20100272967 | ||||
| US20070148598 | ||||
| US4937619 |
Attorney, Agent or Firm:
Shinichiro Tanaka
Hiroyuki Suda
Fumiaki Otsuka
Takayoshi Nishijima
Naoki Kondo
Takeo Nasu
Hiroshi Oura
Hiroyuki Suda
Fumiaki Otsuka
Takayoshi Nishijima
Naoki Kondo
Takeo Nasu
Hiroshi Oura
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