Title:
PROJECTION EXPOSURE SYSTEM AND METHOD
Document Type and Number:
Japanese Patent JP3631094
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To reduce a bias, that is a line width difference which occurs between a repetitive part and an isolated part at the projection of images for exposure to a certain value within a required range independently of the instrumental error of a projection exposure system.
SOLUTION: A stop control device 11 controls at least one of an aperture stop 9, an iris diaphragm 13, and a relay lens system 3. A line width predicting means 12 calculates a bias value between a repetitive part and an isolated part on the basis of data as to a mask pattern, wave front aberration data on a lens 8, size and shape data on the effective light source of a lighting system, half-value width data on the wavelength spectrum of a laser 1, and temperature change data as to a projection lens 8 due to light exposure. When the bias value gets out of an allowable value, the correction of the aperture stop 9 of the projection optical system 8 or the correction of the effective light source of the lighting optical system corresponding to the bias value to correct is calculated, and the stop control device 11 is driven on the basis of this calculation result.
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Inventors:
Koizumi
Kazuhiro Takahashi
Kazuhiro Takahashi
Application Number:
JP2000094954A
Publication Date:
March 23, 2005
Filing Date:
March 30, 2000
Export Citation:
Assignee:
Canon Inc
International Classes:
F21V11/08; F21V11/10; G03F1/36; G03F1/70; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F1/08; G03F7/20
Domestic Patent References:
| JP2050417A | ||||
| JP8250411A | ||||
| JP6120114A |
Foreign References:
| WO1999030356A1 |
Attorney, Agent or Firm:
Jyohei Yamashita
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