Title:
マイクロリソグラフィック投影露光装置のための投影対物レンズ
Document Type and Number:
Japanese Patent JP2007522508
Kind Code:
A
Abstract:
Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.
Inventors:
Kunner, Bernhard
Vabra, Norbert
Gruner, Truff
Epile, alexander
Beder, Susan
Singel, Wolfgang
Vabra, Norbert
Gruner, Truff
Epile, alexander
Beder, Susan
Singel, Wolfgang
Application Number:
JP2006552475A
Publication Date:
August 09, 2007
Filing Date:
December 27, 2004
Export Citation:
Assignee:
Carl Zeiss SMT AG
International Classes:
G02B17/08; G02B21/00; G02B21/04; G03F7/20; H01L21/027
Domestic Patent References:
| JP2000058436A | 2000-02-25 | |||
| JPH06349699A | 1994-12-22 | |||
| JP2000356743A | 2000-12-26 |
Attorney, Agent or Firm:
Masaki Yamakawa
Shigeki Yamakawa
Shigeki Yamakawa