Title:
PROJECTOR SYSTEM, STEREOSCOPIC MOLDING GENERATION APPARATUS USING PROJECTOR SYSTEM AND STEREOSCOPIC MOLDING GENERATION METHOD
Document Type and Number:
Japanese Patent JP2015182413
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a projector system capable of changing properties of objects to be irradiated in parallel at the same time in a three-dimensional region by utilizing an ability to perform projection to a deep region to be projected, and further to provide a stereoscopic molding generation apparatus using the projector system and a stereoscopic molding generation method.SOLUTION: A projector system 2 and a stereoscopic molding generation apparatus 500 having the projector system 2 have a light emission section 10 emitting light for changing properties of objects to be irradiated and further comprise: a light emission adjustment mechanism 100 allowing an emission angle of the light to be adjusted; and a circuit device 80 controlling an emission position and the emission angle of the light. The light passing through the light emission adjustment mechanism 100 is irradiated to a region to be irradiated PD in an irradiation-enabled region PX. On this account, the properties of the objects to be irradiated MP disposed in the region to be irradiated PD can be changed (cured) in parallel at the same time, and a stereoscopic molding can be generated in a short period of time.
Inventors:
MIYASAKA KOICHI
MAKIGAKI TOMOHIRO
MAKIGAKI TOMOHIRO
Application Number:
JP2014063250A
Publication Date:
October 22, 2015
Filing Date:
March 26, 2014
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
B29C67/00
Attorney, Agent or Firm:
Masahiko Ueyanagi
Kazuaki Watanabe
Kazuaki Watanabe
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