Title:
保護膜形成用フィルム及び保護膜形成用複合シート
Document Type and Number:
Japanese Patent JP7326103
Kind Code:
B2
Abstract:
The present invention relates to a film for protective film formation whose Z_100 computed by Z_100=X_min per S_100 is 0.27 or less using a minimum value (X_min) of the absorbance at a wavelength of 2000 to 3200 nm of a protective film (however, except for 2701 to 2999 nm) and specific heat (S_100) at 100℃ of the protective film, and to a composite sheet for protective film formation, comprising: a support sheet; and the film for protective film formation formed on one side of the support sheet.
Inventors:
Usuba Mirei
Hiroyuki Yoneyama
Hiroyuki Yoneyama
Application Number:
JP2019184721A
Publication Date:
August 15, 2023
Filing Date:
October 07, 2019
Export Citation:
Assignee:
Lintec Corporation
International Classes:
H01L21/301; C09J7/10; C09J7/24; C09J7/25; C09J7/35; C09J11/04; C09J11/06; C09J201/00
Domestic Patent References:
| JP2015032644A | ||||
| JP2019059879A | ||||
| JP2018060940A |
Foreign References:
| WO2019131850A1 |
Attorney, Agent or Firm:
Kazuzumi Nishizawa
Mitsunaga Igarashi
Hiroyuki Kato
Mitsunaga Igarashi
Hiroyuki Kato
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