Title:
保護部材形成装置
Document Type and Number:
Japanese Patent JP7339768
Kind Code:
B2
Abstract:
To efficiently form a protective member on a wafer.SOLUTION: After being moved at first speed V1 to a first position Z1 where an upper surface Ra of liquid resin R deposited on a sheet S and a lower surface Wb of a wafer W held on a holding surface 621a have a small gap, the lower surface Wb of the wafer W is moved at second speed V2 slower than the first speed V1 from the first position Z1 to a third position Z3 in which the upper surface Ra of the liquid resin R and the lower surface Wb of the wafer W come into contact with each other, and further, moved to a second position Z2 where a mounting surface 60a and the holding surface 621a have a predetermined interval. The liquid resin R spreads from a central section of the wafer W toward an outer periphery, and pressure that is applied on a liquid resin R and decreases with time is measured. When the pressure decreases up to a set value, the wafer W is separated from the holding surface 621a and a stage 60 and holding means 62 are separated from each other. Then, the liquid resin R is cured using curing means 65.SELECTED DRAWING: Figure 2
Inventors:
Kazutaka Kuwana
Hiroshi Onodera
Daichi Higuchi
Hiroshi Kurokawa
Hiroshi Onodera
Daichi Higuchi
Hiroshi Kurokawa
Application Number:
JP2019089697A
Publication Date:
September 06, 2023
Filing Date:
May 10, 2019
Export Citation:
Assignee:
Disco Co., Ltd.
International Classes:
B05C9/12; H01L21/683; B05C11/00; B05C11/02; B05C11/10; B05C13/02; H01L21/304
Domestic Patent References:
JP2011119578A | ||||
JP2014212188A | ||||
JP2010062269A | ||||
JP2019009372A | ||||
JP2017168565A | ||||
JP2012146872A |
Attorney, Agent or Firm:
Patent Attorney Corporation Tokyo Alpa Patent Office
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