To provide a proximity scan exposure device capable of performing high precision exposure without any exposure irregularity by suppressing fluctuation in illuminometers and by stabilizing the illuminances of respective light sources, and to provide an exposure method thereof.
A light source control section 15a of a proximity scan exposure device 1 includes a proportional device 15b that corrects illuminance signals from respective illuminometers 50 according to a reference illuminance detected by a reference illuminometer 60. The illuminances of respective illumination sections 14 are stabilized by suppressing the fluctuation in the respective illuminometers 50 by the reference illuminometer 60, so as to perform the high precision exposure without any exposure irregularity.
| JP4194160 | Projection exposure equipment |
| JP3842480 | LITHOGRAPHIC PROJECTOR |
| WO/1999/049366 | PHOTOMASK AND PROJECTION EXPOSURE SYSTEM |
Hironori Honda
Toshimitsu Ichikawa