To provide a proximity scanning exposure apparatus and a proximity scanning exposure method in which the unevenness in seams between adjoining exposure regions can be prevented upon performing proximity exposure, using a plurality of masks.
The proximity scanning exposure method includes the steps of measuring the respective gaps g between a mask M and a substrate W by using three gap sensors 87a, 87b, 87c, by each mask; adjusting the planarity of the mask M so as to control the differences in the gaps g to be within a tolerance, based on the respective measured gaps g; remeasuring the respective gaps g between the mask M and the substrate W by using the three gap sensors 87a, 87b, 87c, after the planarity of the mask M is adjusted by each mask; calculating the gap at the center position of the mask M from the remeasured gaps g; and adjusting the height of the mask M by driving a mask driver 12, in such a manner that the calculated gap at the center position of each mask M becomes identical to those of others.
| JP2009122378A | 2009-06-04 | |||
| JP2008306109A | 2008-12-18 | |||
| JP2008304854A | 2008-12-18 | |||
| JP2008304853A | 2008-12-18 | |||
| JP2008304852A | 2008-12-18 | |||
| JP2008304851A | 2008-12-18 | |||
| JP2008304836A | 2008-12-18 | |||
| JP2008304835A | 2008-12-18 | |||
| JP2008304537A | 2008-12-18 |
| WO2008120785A1 | 2008-10-09 |
Hironori Honda
Toshimitsu Ichikawa