To provide a purification means capable of easily removing a particle substance without clogging it to a purification device, or the like, easily carrying out the maintenance of a purification processing and equipment and sufficiently exhibiting the purification ability of a purification agent in the purification processing of harmful gas containing the particle substance discharged from a semiconductor manufacturing step.
In a purification cylinder utilizing a dry processing method, a horizontal plate is provided at a position above a filling part of the purification agent and below an introduction port of the harmful gas; a circulation pipe for circulating the harmful gas introduced from the introduction port to a lower part of the horizontal plate is provided by penetrating through the horizontal plate from an upper direction; and a space formed by an inner wall surface of the horizontal plate and an outer side surface of the circulation pipe is made as an accumulation part of the particulate substance.
SHIMADA TAKASHI
IKEDA TOMOHISA
SUZUKI KIKO
| JPS63302922A | 1988-12-09 | |||
| JPH05146624A | 1993-06-15 | |||
| JPH0515722A | 1993-01-26 | |||
| JPH0295526U | 1990-07-30 | |||
| JP2000229217A | 2000-08-22 |
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