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Title:
PURIFICATION OF ORGANOMETAL COMPOUND
Document Type and Number:
Japanese Patent JP3525371
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To industrially efficiently purify an organometal compound containing impurities into the highly pure product useful as a material for compound semiconductors by using a specific device.
SOLUTION: This method for purifying an organic metal compound comprises evaporating the organometal compound of the formula or the formula: R-M2-R (R is a 1-3C alkyl; M1 is a trivalent metal atom; M2 is a divalent metal atom) (preferably trimethylindium), passing the vapor through a heat exchange device 8 having a double pipe structure comprising an inner pipe 8a and an outer pipe 8b wherein the outer pipe 8b is cooled at a lower temperature than the melting point of the compound, once depositing the compound on the inner surface of the inner pipe 8a of the heat exchange device 8, heating the outer pipe 8b of the heat exchange device 8 to again evaporate the compound deposited on the inner surface of the inner pipe 8a of the heat exchange device 8, and depositing and filling the reevaporated compound in a filling vessel 5 connected to the heat exchange device 8 and cooled to a described temperature. The cooling temperature is preferably -70 to 10°C, and the heating temperature is preferably 20-100°C.


Inventors:
Osaki, Hiromi
Hirahara, Kazuhiro
Ishihara, Toshinobu
Kaneko, Isao
Application Number:
JP1996000184105
Publication Date:
May 10, 2004
Filing Date:
June 25, 1996
Export Citation:
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Assignee:
SHIN ETSU CHEM CO LTD
International Classes:
B01D8/00; B01D5/00; B01D7/00; C07F3/00; C07F5/00; C23C16/44; (IPC1-7): C07F5/00; B01D8/00; C07F3/00; C07F5/00
Attorney, Agent or Firm:
▲高▼野 俊彦