Title:
PURIFICATION OF ORGANOMETALLIC COMPOUND
Document Type and Number:
Japanese Patent JP3624437
Kind Code:
B2
Abstract:
PURPOSE: To obtain a high-purity organometallic compound from an organometallic compound containing a slight amount of oxygen-containing component by heating the crude organometallic compound together with a specific amount of a halogenated alkali salt in an oxygen-free atmosphere and removing the oxygen-containing component from the organometallic compound by distillation, etc.
CONSTITUTION: An organometallic compound of formula R1R2MX (R1 and R2 each is an alkyl or a cycloalkadienyl; M is Ga or In; X is an alkyl, a halogen or H) (preferably trimethylindium) containing a slight amount of oxygen- containing component is heat-treated together with 0.1-10wt.% of a halogenated alkali salt (preferably potassium fluoride) in the presence of preferably 0.5-5wt.% of an alkylaluminum in an essentially oxygen-free atmosphere. The treated organometallic compound is purified by distillation or sublimation.
Inventors:
Yako Tadaaki
Yasuo Oga
Yasuo Oga
Application Number:
JP20348794A
Publication Date:
March 02, 2005
Filing Date:
August 29, 1994
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07B63/02; C07F5/00; (IPC1-7): C07F5/00; C07B63/02
Domestic Patent References:
| JP2067230A | ||||
| JP3112991A | ||||
| JP2295991A | ||||
| JP62132888A | ||||
| JP62258388A | ||||
| JP2184690A | ||||
| JP62185090A | ||||
| JP1100178A | ||||
| JP3123783A |
Attorney, Agent or Firm:
Takashi Kuboyama