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Title:
PURIFICATION OF TRIFLUOROMETHANE
Document Type and Number:
Japanese Patent JP3856409
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To obtain the highly pure compound hardly containing impurities by industrially easily and profitably treating a crude trifluoromethane product containing compounds having chlorine and bromine as impurities by a specific purification method.
SOLUTION: This method for purifying trifluoromethane comprises reacting a crude trifluoromethane product containing compounds having chlorine and bromine as impurities with hydrogen fluoride in the presence of a fluorination catalyst (e.g. a carrier type catalyst mainly containing chromium) in a gas phase at an enhanced temperature to convert the chlorine and the bromine into hydrogen chloride and hydrogen bromide, and subsequently removing an acid content containing the hydrogen chloride and the hydrogen bromide preferably by a method for bringing the acid content into contact with a purifying agent to react the acid content with the purifying agent. The reaction of the crude product with the hydrogen fluoride is preferably carried out at 120-400°C at the atmospheric pressure to 1.5 MPa. The purifying agent preferably comprises quick lime, sodium aluminate, etc., or a carbonaceous solid material such as activated carbon.


Inventors:
Hiroki Ohno
Tetsuo Nakajo
Toshio Oi
Arai Ryuharu
Application Number:
JP11832297A
Publication Date:
December 13, 2006
Filing Date:
May 08, 1997
Export Citation:
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Assignee:
SHOWA DENKO K.K.
International Classes:
B01J23/06; C07C17/42; B01J23/26; B01J23/755; C07C17/395; C07C19/08; (IPC1-7): C07C19/08; B01J23/06; B01J23/26; B01J23/755; C07C17/395; C07C17/42
Domestic Patent References:
JP39021825B1
JP42003004B1
JP49043922B1
JP49000164B1
JP60019733A
Attorney, Agent or Firm:
Teruo Akimoto