Title:
PURIFYING METHOD OF PHODIUM
Document Type and Number:
Japanese Patent JP3835487
Kind Code:
B2
Abstract:
PURPOSE: To provide a method for selectively and quantitatively separating a cationic base metal impurities having difficulty in separation using a cation exchange resin from rhodium and a method for recovering rhodium at high yield.
CONSTITUTION: The purifying method of rhodium is constituted so as to mix an aq. solution containing rhodium and chloride ions, in which the impurities coexist, with tributyl phosphate, next to mix the water phase with a sparingly water soluble higher carboxylic acid, to dissolve a compound forming a hardly soluble chlorinated rhodium complex salt in the resultant water phase and to thermally decompose the deposited crystal in gaseous hydrogen flow. The compound is preferably ethylene diamine or the salt.
Inventors:
Satoshi Asano
Naoyuki Tsuchida
Sasaki Corporation
Takahiro Yamada
Akihiro Kawamoto
Naoyuki Tsuchida
Sasaki Corporation
Takahiro Yamada
Akihiro Kawamoto
Application Number:
JP3426695A
Publication Date:
October 18, 2006
Filing Date:
January 31, 1995
Export Citation:
Assignee:
Sumitomo Metal Mining Co., Ltd.
International Classes:
C22B11/00; C22B3/20; C22B11/06; (IPC1-7): C22B11/00; C22B11/06
Domestic Patent References:
JP6220553A |
Attorney, Agent or Firm:
Yoshiteru Oshida
Previous Patent: ホール装置のオフセット電圧を減少させる方法
Next Patent: REMOVAL OF ORGANIC IMPURITY IN AQUEOUS SOLUTION OF HYDROGEN PEROXIDE
Next Patent: REMOVAL OF ORGANIC IMPURITY IN AQUEOUS SOLUTION OF HYDROGEN PEROXIDE