QUARTZ GLASS-MADE MEMBER HAVING FILM

Japanese Patent JP2883028

B2

PROBLEM TO BE SOLVED: To provide a quartz glass-made member with thermal shock resistance as well as long term stability for the chemical resistance to hydrofluoric acid, nitric acid and mixture thereof and the diffusion of the semiconductor hazardous material to semiconductor by a method, wherein the film of the glass-made member contains silicon carbide and a gradient layer made of additional components whose concentration is differentiated in the thickness directions.
SOLUTION: The surface of a member 2 is chemically roughened, while the layer directly adjacent to the member 1 is an intermediate layer 3 made of polycrystalline silicon. Within the gradient layer 4 made of silicon and silicon carbide succeeding to the intermediate layer 3, the concentration of the silicon carbide is increased continuously from the adjacent region to the intermediate layer 3 to the outer part. On the contrary, the silicon concentration is decreased in the thickness direction. Moreover, the surface of a surface layer 5 made of silicon carbide, simultaneously forming the outer surface of the film 2, is made of high purity silicon carbide. In such a constitution, the reason for the gradient layer 4 reducing stresses in the film 2 is the notably lower hardness of silicon as an additional component than that of the silicon carbide, as well as the notably lower modulus of elasticity than that of silicon carbide.

HORU EE BURAIDENBATSUHA
DEIITOMAARU HERUMAN
HERUMUUTO REEBAA

JP20813595A

April 19, 1999

August 15, 1995

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SHINETSU SEKIEI KK
HEREUSU KUARUTSUGURAASU GMBH

B32B17/06; B32B18/00; C03C17/22; C03C17/34; C04B41/87; C23C16/02; C23C16/32; C23C16/44; H01L21/205; H01L21/22; H01L21/31; H01L21/673; H01L21/68; H01L21/683; (IPC1-7): H01L21/68; H01L21/205; H01L21/22; H01L21/31

Soga Doteru (6 people outside)

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