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Title:
RADIATION-CURING COMPOSITION, METHOD FOR STORING THE SAME, METHOD FOR FORMING CURED FILM, PATTERN FORMING METHOD, PATTERN USING METHOD, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE
Document Type and Number:
Japanese Patent JP2006195175
Kind Code:
A
Abstract:

To provide a radiation-curing composition giving a hardened body excellent in pattern accuracy even under relatively small exposure energy, a method for storing the same, a method for forming a cured film, and a pattern forming method, and to provide a pattern using method using the pattern as a resist mask, electronic components, and an optical waveguide.

The radiation-curing composition comprises (a) siloxane resin, (b) a photo acid generator or a photo base generator, and (c) a solvent capable of dissolving the component (a) and containing an aprotic solvent, wherein the content ratio of water in the radiation-curing composition is ≤2 mass%.


Inventors:
SAKURAI HARUAKI
ABE KOICHI
Application Number:
JP2005006610A
Publication Date:
July 27, 2006
Filing Date:
January 13, 2005
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
G03F7/075; G03F7/004; H01L21/027
Domestic Patent References:
JP2001022083A2001-01-26
JPH04366958A1992-12-18
JPH06148887A1994-05-27
JP2000221687A2000-08-11
JPH08120084A1996-05-14
JP2004102247A2004-04-02
JP2002128904A2002-05-09
JPH0497363A1992-03-30
Foreign References:
WO2003077029A12003-09-18
Attorney, Agent or Firm:
Yoshiki Hasegawa
Shiro Terasaki
Ryugo Akahori