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Title:
RADIATION GRAFT POLYMERIZATION
Document Type and Number:
Japanese Patent JP2000053788
Kind Code:
A
Abstract:

To provide a method of radiation graft polymerization capable of attaining high graft rate for porous sheet-like materials such as woven fabrics and nonwoven fabrics as fiber assembly or low-porous or nonporous materials such as nets and films.

This method of radiation graft polymerization comprises the following procedure: a monomer solution is impregnated into a base material 1 to be graft-polymerized in such a state as to be in mutual contact between the base material 1 and a base material support material 2 to perform a graft polymerization reaction under holding the monomer solution at least on the support material 2; alternatively, a base material to be graft-polymerized is irradiated with radiation and then superposed upon a base material support material so as to be in contact with the support material followed by impregnating the resultant base material with a monomer solution to perform a graft polymerization reaction under holding the monomer solution at least on the support material.


Inventors:
SUGO TAKANOBU
FUJIWARA KUNIO
KONISHI SATOSHI
Application Number:
JP22776498A
Publication Date:
February 22, 2000
Filing Date:
August 12, 1998
Export Citation:
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Assignee:
JAPAN ATOMIC ENERGY RES INST
EBARA CORP
International Classes:
C08J7/18; C08F2/00; C08J9/40; D06M13/402; D06M14/00; D06M14/18; (IPC1-7): C08J7/18; C08F2/00; C08J9/40; D06M14/18
Attorney, Agent or Firm:
Kazuo Shamoto (5 outside)