RADIATION-SENSITIVE COATING COMPOSITION AND PRODUCTION OF SEMICONDUCTOR USING THAT - Rohm and Haas Electronic Materials, L.L.C.

Title:

RADIATION-SENSITIVE COATING COMPOSITION AND PRODUCTION OF SEMICONDUCTOR USING THAT

Document Type and Number:

Japanese Patent JP3784096

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To obtain a radiation-sensitive coating compsn. which decreases influences of reflectiora on a single layer process and has high resolution with an excellent patterning form. SOLUTION: This radiation-sensitive coating compsn. consists of an alkali- soluble resin, a solvent and a radiation-sensitive compd. Further, such a phosphor material is included in the compsn. that when the phosphor is irradiated with radiation (first radiation), it emits radiation (second radiation) of a wavelength longer by 1 to 150nm than the wavelength of the first radiation and shorter than 500nm. Thereby, the obtd. compsn. decreases influences of reflection on a single layer process and has high resolution.

Inventors:

Mineo Nishi
Kusumoto Tadashi

Application Number:

JP34824595A

Publication Date:

June 07, 2006

Filing Date:

December 19, 1995

Export Citation:

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Assignee:

Rohm and Haas Electronic Materials, L.L.C.

International Classes:

G03F7/004; C09D5/00; C09D5/22; C09D5/32; C09D5/33; C09K11/06; G03F7/022; G03F7/023; G03F7/20; H01L21/027; (IPC1-7): G03F7/004; G03F7/004; C09D5/22; C09D5/32; C09D5/33; C09K11/06; G03F7/022; G03F7/023; G03F7/20; H01L21/027

Domestic Patent References:

JP6051508A
JP7271037A
JP7181687A
JP5191000A

Attorney, Agent or Firm:

Minoru Senda
Hisashi Tsuji
Koji Hashimoto

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