Title:
RADIATION SENSITIVE COMPOSITION CONTAINING FLUORESCENT MATERIAL DISPERSED INTO THIS COMPOSITION
Document Type and Number:
Japanese Patent JP3814926
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a radiation sensitive composition having the fluorescent material dispersed in it capable of enlarging a developing margin at the time of forming a pattern and retaining sufficient film thickness even after finishing irradiation with radiation and development and baking and forming a fluorescent screen high in emission luminance by incorporating a radiation radical generator comprising the fluorescent material, an organic polymer binder, a photocross- linkable monomer and/or oligomer and an acridine derivative.
SOLUTION: This radiation sensitive composition having the fluorescent material dispersed in it contains the radiation radical generator comprising the fluorescent material, the organic polymer binder, the photocross-linkable monomer and/or oligomer and the acridine derivative. The organic polymer binder is embodied by various resins but, especially preferably, alkali-soluble resins. The photocross-linkable monomer and oligomer are embodied by alkylene glycol di(meth)acrylate, like ethylene and propylene glycol di(meth)acrylate and polyalkylene glycol di(meth)acrylate, like polyethylene or polypropylene glycol di(meth)acrylate, and the like.
Inventors:
Hideaki Masuko
S. Takahashi
Tadahiko Udagawa
Kumano Atsushi
S. Takahashi
Tadahiko Udagawa
Kumano Atsushi
Application Number:
JP8551697A
Publication Date:
August 30, 2006
Filing Date:
March 21, 1997
Export Citation:
Assignee:
JSR CORPORATION
International Classes:
G03F7/004; C08F2/44; C08F2/46; C09D4/02; G03F7/027; G03F7/028; H01J9/14; H01J9/227; H01J11/42; H01J17/04; (IPC1-7): G03F7/004; C08F2/44; C08F2/46; C09D4/02; G03F7/027; G03F7/028; H01J17/04
Domestic Patent References:
| JP9061996A | ||||
| JP6289611A | ||||
| JP6348013A |
Attorney, Agent or Firm:
Toshiaki Fukuzawa