To provide a radiation-sensitive composition which forms a crosslinked structure upon exposure to radiation, is degraded to low molecular weight by heating at a relatively low temperature after crosslinking, can easily be removed without damaging a substrate, has a high stationary wave preventing effect, does not cause intermixing with a resist film, and is useful to form a hard mask capable of forming a resist pattern excellent in resolution, pattern profile, etc.
The radiation-sensitive composition comprises (A) a copolymer typified by a copolymer having a repeating unit represented by formula (1-1) and a repeating unit represented by formula (2-1), (B) a radiation-sensitive acid generator and (C) a solvent. In the formula (1-1), R5 denotes hydrogen atom or methyl group.
TANAKA MASATO
KONNO KEIJI
NOMURA NAKAATSU
SHIMOKAWA TSUTOMU
